Fabrication of high-aspect-ratio nano structures using a nano x-ray shadow mask
Author:
Publisher
IOP Publishing
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,Electronic, Optical and Magnetic Materials
Reference17 articles.
1. Nanoimprint lithography
2. Stamp design effect on 100 nm feature size for 8 inch NanoImprint lithography
3. Protein Nanoarrays Generated By Dip-Pen Nanolithography
4. Biofunctionalized nanoarrays of inorganic structures prepared by dip-pen nanolithography
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1. Wafer scale manufacturing of high precision micro-optical components through X-ray lithography yielding 1800 Gray Levels in a fingertip sized chip;Scientific Reports;2022-02-17
2. Fabrication of ultrahigh-aspect-ratio and periodic silicon nanopillar arrays using dislocation lithography and deep reactive-ion etching;Journal of Micromechanics and Microengineering;2019-08-22
3. Reusable silicon shadow mask with sub-5 μm gap for low cost patterning;Sensors and Actuators A: Physical;2016-05
4. A novel nanochannel fabrication for nanofluidic applications using synchrotron radiation via a micro patterned X-ray mask;RSC Advances;2016
5. Fabrication of multi-scale structures with multiple X-ray masks and synchrotron hard X-ray irradiations;Current Applied Physics;2014-05
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