Efficient fabrication of high quality SU-8 photoresist based microsphere lasers via emulsion

Abstract

Abstract SU-8 photoresist is a highly important material in the field of microfabrication and photonics owing to its low cost, excellent chemical and mechanical durability, high refractive index and transparency in the visible range. As a result, SU-8 photoresist has been employed as a cavity matrix for microsphere lasers. However, the current fabrication technique of SU-8 based microsphere lasers is complex and time-consuming. Here, we demonstrate a novel, cost-effective fabrication method for dye-doped SU-8 microspheres with diameters ranging from about 15–100 µm. These microspheres exhibit efficient lasing emission under optical pulse excitation. Lasing thresholds of 20–30 µJ mm−2 and quality factors ranging from 1500 to 3000 are achieved. The size dependence of lasing characteristics indicates that the lasing mechanism is due to whispering gallery mode. Interestingly, these microsphere lasers can work in water, presenting promising application prospects in the fields of biological and chemical sensors.