Self-pulsing discharge in hollow cathode simulated by a fluid model-Reference-Cited by-同舟云学术

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Self-pulsing discharge in hollow cathode simulated by a fluid model

Published:2021-09-07 Issue:48 Volume:54 Page:485203
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

He Shoujie^ORCID,Zhao Lifen,Jing Ha,Zhang Ya,Qing Li

Funder

College Student Innovation Fund Project of Hebei University

Science and Technology Research Projects of Colleges and Universities

National Science Foundation of China

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1088/1361-6463/ac2171/pdf

Reference41 articles.

1. Maskless and contactless patterned silicon deposition using a localized PECVD process;Leal;Plasma Sources Sci. Technol.,2020

2. Transition characteristics of low-pressure discharges in a hollow cathode;Fu;Phys. Plasmas,2017

3. Numerical study of the power deposition in low-pressure hollow cathode arc discharges;Cong;J. Phys. D: Appl. Phys.,2020

4. Experimental investigations of enhanced glow based on a pulsed hollow-cathode discharge;Liang;Plasma. Sci. Technol.,2019

5. Analysis of the self- pulsing operating mode of a microdischarge;Aubert;Plasma Sources Sci. Technol.,2007

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Impedance matching design of capacitively coupled plasma with fluid and external circuit coupled model;Plasma Processes and Polymers;2024-04-06

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