Microsputterer with integrated ion-drag focusing for additive manufacturing of thin, narrow conductive lines-Reference-Cited by-同舟云学术

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Microsputterer with integrated ion-drag focusing for additive manufacturing of thin, narrow conductive lines

Published:2018-04-04 Issue:16 Volume:51 Page:165603
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Kornbluth Y S^ORCID,Mathews R H,Parameswaran L^ORCID,Racz L M^ORCID,Velásquez-García L F^ORCID

Funder

US Air Force

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/51/i=16/a=165603/pdf

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fully 3D‐Printed, Ultrathin Capacitors via Multi‐Material Microsputtering;Advanced Materials Technologies;2022-04-03

2. Biomedical Applications of Metal 3D Printing;Annual Review of Biomedical Engineering;2021-07-13

3. Nano-additively manufactured gold thin films with high adhesion and near-bulk electrical resistivity via jet-assisted, nanoparticle-dominated, room-temperature microsputtering;Additive Manufacturing;2020-12

4. Thin‐film deposition by combining plasma jet with spark discharge source at atmospheric pressure;Contributions to Plasma Physics;2020-11-09

5. Employing a MEMS plasma switch for conditioning high-voltage kinetic energy harvesters;Nature Communications;2020-06-26

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