A poly-diagnostic study of bipolar high-power magnetron sputtering: role of electrical parameters
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1088/1361-6463/aba01e/pdf
Reference55 articles.
1. Vacuum Evaporation and Vacuum Deposition
2. 16. Vacuum Deposition Techniques
3. Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings
4. Microstructural evolution during film growth
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1. Analysis of a second peak of electron density observed in high-power impulse magnetron sputtering plasma using a Langmuir probe;Japanese Journal of Applied Physics;2024-01-01
2. Influence of Voltage, Pulselength and Presence of a Reverse Polarized Pulse on an Argon–Gold Plasma during a High-Power Impulse Magnetron Sputtering Process;Plasma;2023-11-20
3. Temporal, spatial and spectroscopic study of plasma emission on Cu target in bipolar HiPIMS;Plasma Sources Science and Technology;2023-07-01
4. Insights on film growth conditions on a floating substrate during reactive Ar/O2 bipolar high power impulse magnetron sputter deposition;Journal of Physics D: Applied Physics;2023-01-25
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