Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms-Reference-Cited by-同舟云学术

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Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms

Published:2017-04-24 Issue:20 Volume:50 Page:204002
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Hoppe C,Mitschker F,Giner I,de los Arcos T,Awakowicz P,Grundmeier G

Funder

Deutsche Forschungsgemeinschaft

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/50/i=20/a=204002/pdf

Reference50 articles.

1. Defect-permeation correlation for ultrathin transparent barrier coatings on polymers

2. SiOx Gas Barrier Coatings on Polymer Substrates: Morphology and Gas Transport Considerations

3. Thin-Film Permeation-Barrier Technology for Flexible Organic Light-Emitting Devices

4. Inhibition of Interfacial Oxidative Degradation During SiOxPlasma Polymer Barrier Film Deposition on Model Organic Substrates

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