CMOS platform for atomic-scale device fabrication
Author:
Funder
NCCR
EU-FET
Publisher
IOP Publishing
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering
Link
http://iopscience.iop.org/article/10.1088/1361-6528/aad7ab/pdf
Reference23 articles.
1. Confinement of Electrons to Quantum Corrals on a Metal Surface
2. 3.1 Introduction to manipulation of surfaces with the methods of scanning probe microscopy
3. Toward Atomic-Scale Device Fabrication in Silicon Using Scanning Probe Microscopy
4. Atomic-Scale Desorption Through Electronic and Vibrational Excitation Mechanisms
5. Atomic-scale conversion of clean Si(111):H-1×1 to Si(111)-2×1 by electron-stimulated desorption
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1. DNA-based doping and fabrication of PN diodes;Frontiers in Nanotechnology;2024-02-21
2. Quantifying the Variation in the Number of Donors in Quantum Dots Created Using Atomic Precision Advanced Manufacturing;The Journal of Physical Chemistry C;2023-03-15
3. Electric current paths in a Si:P delta-doped device imaged by nitrogen-vacancy diamond magnetic microscopy;Nanotechnology;2022-10-20
4. Conductivity and size quantization effects in semiconductor $$\delta$$-layer systems;Scientific Reports;2022-09-30
5. Accelerated Lifetime Testing and Analysis of Delta-Doped Silicon Test Structures;IEEE Transactions on Device and Materials Reliability;2022-06
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