Electron trapping at SiO2/4H-SiC interface probed by transient capacitance measurements and atomic resolution chemical analysis
Author:
Funder
ECSEL JU
Publisher
IOP Publishing
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering
Link
http://iopscience.iop.org/article/10.1088/1361-6528/aad129/pdf
Reference29 articles.
1. Material science and device physics in SiC technology for high-voltage power devices
2. Recent advances on dielectrics technology for SiC and GaN power devices
3. Threshold Voltage Instability in 4H-SiC MOSFETs With Phosphorus-Doped and Nitrided Gate Oxides
4. Basic Mechanisms of Threshold-Voltage Instability and Implications for Reliability Testing of SiC MOSFETs
5. Interfacial Defects in SiO2Revealed by Photon Stimulated Tunneling of Electrons
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1. Impact of the NO annealing duration on the SiO2/4H–SiC interface properties in lateral MOSFETs: The energetic profile of the near-interface-oxide traps;Materials Science in Semiconductor Processing;2024-01
2. Energy levels of carbon dangling-bond center (PbC center) at 4H-SiC(0001)/SiO2 interface;APL Materials;2023-11-01
3. From dissolution to controlled macrostepping of 4H-SiC during liquid Si-induced structuring in a sandwich configuration;Journal of Crystal Growth;2023-09
4. Atomic scale localization of Kohn–Sham wavefunction at SiO2/4H–SiC interface under electric field, deviating from envelope function by effective mass approximation;Applied Physics Letters;2023-05-29
5. Transport Phenomena during Liquid Si-Induced 4H-SiC Surface Structuring in a Sandwich Configuration;Solid State Phenomena;2023-05-25
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