Atomic layer deposition of ZnO on polypropylene nonwovens for photocatalytic antibacterial facemasks

Abstract

Abstract Addressing respiratory infectious diseases remains one of the main priorities due to the increased risk of exposure caused by population growth, increasing international travel and commerce, and most recently, the COVID-19 outbreak. In the war against respiratory diseases, facemasks are powerful tools to obstruct the penetration of microorganisms, thereby protecting the wearer from infections. Nonetheless, the intercepted microorganisms on the surface of facemasks may proliferate and lead to secondary infection. To solve this problem, atomic layer deposition is introduced to deposit uniform and mechanically robust ZnO layers on polypropylene (PP) nonwoven fabrics, a widely used raw material in fabricating facemasks. The loading of ZnO demonstrates no adverse effects on the separation performance of facemasks, and the filtration efficiency of the facemasks towards different types of nanoparticles remains higher than 98.9%. Moreover, the modified PP nonwoven fabrics are granted with excellent antibacterial activity and photocatalytic sterilization ability, which can inactivate both germ-negative and germ-positive bacteria (E. coli and S. aureus) effectively with and without light illumination. Therefore, the modified PP nonwoven fabrics are potential candidates to be used as the outer layer on facemasks and endow them with photocatalytic antibacterial activity.