Femtosecond Laser Double Pulses Nanofabrication on Silicon

Abstract

Abstract The temporal shaping femtosecond (fs) laser is realized by dividing a fs laser pulse into two identical sub-pulses. The double-pulse fs laser can be used to effectively control the initial free electron state such as electron temperature, capacity and density, etc. to improve the surface morphology quality. In this experiment, silicon was fabricated using the double-pulse fs laser. It was found that the average diameter of ablated micro-or nanoholes decreases with the increasing pulse delay (up to 1.5 ps) under the same laser fluence and the phenomenon was explained quantitatively by the plasma model. Furthermore, nanoholes were achieved using the double-pulse fs laser, which cannot be obtained by single pulse laser, and the processing size can be reduced to below 200 nm.