Author:
Maslov A L,Polushin N I,Laptev A I,Vysotina E A,Martynova T V
Abstract
Abstract
Polycrystalline diamond films are used in various fields of science and technology, for example, in photonics and electronics. The growth of high-quality polycrystalline films is restrained by the formation of small cracks at the periphery, which are associated with thermal stresses, as well as a low growth rate. Treatment of the substrate surface makes it possible to increase the initial rate of film formation and to form a continuous layer of diamond film on its surface. In this work, we presented the results of the synthesis of polycrystalline films, the optimal deposition mode and the growth rate of such the film and the topology of its surface. The results obtained in the future will make it possible to obtain high-quality polycrystalline diamond films of a larger area, which will significantly increase the diameter of finished products made of them.