Influence of Annealing Temperature on Surface Morphological and Electrical Properties of Aluminum Thin Film on Glass Substrate by Vacuum Thermal Evaporator-Reference-Cited by-同舟云学术

Influence of Annealing Temperature on Surface Morphological and Electrical Properties of Aluminum Thin Film on Glass Substrate by Vacuum Thermal Evaporator

Published:2017-08 Issue: Volume:226 Page:012180
ISSN:1757-8981
Container-title:IOP Conference Series: Materials Science and Engineering
language:
Short-container-title:IOP Conf. Ser.: Mater. Sci. Eng.

Author:

Wibowo K.M.,Sahdan M.Z.,Asmah M.T.,Saim H.,Adriyanto F.,Suyitno ,Hadi S.

Publisher

IOP Publishing

Subject

General Medicine

Link

http://stacks.iop.org/1757-899X/226/i=1/a=012180/pdf

Reference9 articles.

1. Development and mean life of aluminum first-surface mirrors for solar energy applications

2. Aluminium oxide prepared by UV/ozone exposure for low-voltage organic thin-film transistors

3. Aluminum metallization for flat-panel displays using ion-beam-assisted physical vapor deposition

4. Effect of Deposition Rate on Structure and Surface Morphology of Thin Evaporated Al Films on Dielectrics and Semiconductors

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