In situ plasma cleaning of large-aperture optical components in ICF

Abstract

Abstract The organic contamination damage of large-aperture optical components limits laser energy improvement of inertial confinement fusion (ICF). In situ cleaning of large-aperture optical components via low-pressure plasma is expected to remove organic contaminants from the optical surface. Herein, low-pressure air plasma equipment was proposed and used on surfaces of SiO2 sol–gel antireflection (AR) films in situ by conducting experiments. Its electrical discharge parameters were investigated and optimized during plasma cleaning. Plasma diffusion characteristics and homogeneity in large-aperture windows were analyzed by optical emission spectroscopy. Dramatic degradation in the optical properties of components was observed after organic contamination for 5 h. Transmittance, laser-induced damage threshold and surface morphology observation results demonstrated that low-pressure air plasma removed the organic contaminants from the surface of sol–gel AR films without causing damage and metal contamination. After plasma cleaning, the hydrophilicity of the films increased significantly due to the increase in the polar components of surface free energy. The mechanism of plasma cleaning organic contaminants was confirmed by x-ray photoelectron spectroscopy measurements. These salient results provide a new alternative method for removing organic contaminants in situ from large-aperture optical components and a foundation for improving the energy output of the ICF system.