Chemical sputtering of carbon by combined exposure to nitrogen ions and atomic hydrogen
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Reference58 articles.
1. Structural properties and electronic structure of low-compressibility materials: β-Si3N4and hypothetical β-C3N4
2. Plasma-deposited a-C(N): H films
3. Nitrogen Incorporation into Tetrahedral Hydrogenated Amorphous Carbon
4. In situ deposition and etching process of a-C:H:N films in a dual electron cyclotron resonance–radio frequency plasma
5. Chemical sputtering of carbon films by low energy N2+ ion bombardment
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