Reactive ion etching of indium-tin oxide films by CCl4-based Inductivity Coupled Plasma-Reference-Cited by-同舟云学术

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Reactive ion etching of indium-tin oxide films by CCl4-based Inductivity Coupled Plasma

Published:2016-08 Issue: Volume:741 Page:012105
ISSN:1742-6588
Container-title:Journal of Physics: Conference Series
language:
Short-container-title:J. Phys.: Conf. Ser.

Author:

Juneja Sucheta,Poletayev Sergey D,Fomchenkov Sergey,Khonina Svetlana N,Skidanov Roman V,Kazanskiy Nikolay L

Publisher

IOP Publishing

Subject

General Physics and Astronomy

Link

http://stacks.iop.org/1742-6596/741/i=1/a=012105/pdf

Reference24 articles.

1. Transparent films on polymers for photovoltaic applications

2. Fabrication of antireflection structures on TCO film for reflective liquid crystal display

3. Effect of MIM and n-Well Capacitors on Programming Characteristics of EEPROM

4. Influence of O2 admixture and sputtering pressure on the properties of ITO thin films deposited on PET substrate using RF reactive magnetron sputtering

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3. Development and Research of a Deep Anisotropic Process for the Polysilicon Gates Implementation Using the ICP-RF System;2021 IEEE Conference of Russian Young Researchers in Electrical and Electronic Engineering (ElConRus);2021-01-26

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