A low insertion loss RF switch using a 130 nm SOI process

Author:

Zhang Caozheng,Zheng Libo,Yu Jinghao,Ye Pengfei,Liu Yi

Abstract

Abstract To realize a better radio frequency (RF) communication system, the RF switch, as an important module, is used to cooperate with other devices to form an RF front end for optimizing communication performances. This paper designs a single-pole multi-throw (SPMT) RF switch, which exhibits a low insertion loss of 0.57 dB at 1.9 GHz under the voltage of 2.2 to 4.7 V. The RF switch is fabricated using a 130 nm silicon-on-insulator (SOI) complementary metal-oxide-semiconductor (CMOS) process. It can be used in multi-frequency and multi-mode applications such as 4G/5G. The proposed RF switch has competitive performance and can be combined with other modules to achieve better wireless communication and promote the development of ultra-wideband and multi-mode wireless communication systems.

Publisher

IOP Publishing

Subject

General Physics and Astronomy

Reference12 articles.

1. A Low Insertion-Loss 10-110 GHz Digitally Tunable SPST Switch in 22 nm FD-SOI CMOS;Ciocoveanu,2018

2. GaN/Si Ka-band SPDT for observation payloads;Polli,2019

3. A 28-GHz Low-Loss AlGaN/GaN HEMT for TX/RX Switches in 5G Base Stations;Fletcher;J. Electron. Mater.,2022

4. A New Wideband, Low Insertion Loss, High Linearity SiGe RF Switch;Cheon;IEEE Microwave and Wireless Components Letters,2020

5. A SPDT RF Switch Small- and Large-Signal Characteristics on TR-HR SOI Substrates;Kazemi Esfeh;IEEE Journal of the Electron Devices Society,2018

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