Preparation of Tilted Grating Structure by Nanoimprinting Material with High Refractive Index

Abstract

Abstract The vigorous development of the semiconductor industry has made people’s demand for semiconductor devices increasingly high, but with the shrinking specifications of components, traditional lithography technology has been unable to adapt to the needs of pattern refinement. In optical lithography, it is difficult to produce patterns with feature dimensions of less than 7 nm. Nano-embossing lithography technology, as the next generation of lithography technology, has reached a feature size of less than 5 nm, and even according to relevant reports, the processing accuracy of the technology has reached 2 nm. In this paper, we experimentally illustrate the structural change trend of the inclined grating structure after continuous imprinting, so that the structural height will show a downward trend with the increase of the number of embossing, and the line width of the structural plane will show an upward trend. The best effect is obtained by obtaining high refractive index glue 133 repetitive imprinting two kinds of inclined grating structures. And the nature of the embossing adhesive is proportional to its refractive index, and the higher the refractive index of the embossing adhesive with better imprinting properties.