Growth of Multilayer Optics for Synchrotron Radiation Sources
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/425/i=5/a=052023/pdf
Reference10 articles.
1. The FERMI@Elettra free-electron-laser source for coherent x-ray physics: photon properties, beam transport system and applications
2. Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure
3. Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source
4. Thermal and stress studies of normal incidence Mo/B_4C multilayers for a 67 nm wavelength
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1. Multilayer Optics for Synchrotron Applications;Advanced Materials Technologies;2024-04-20
2. Investigation of long term stability of W/B4C multilayer structures;Thin Solid Films;2022-08
3. Angle resolved photoelectron spectroscopy as applied to X-ray mirrors: an in depth study of Mo/Si multilayer systems;Physical Chemistry Chemical Physics;2019
4. Microstructure and composition analysis of low-Z/low-Z multilayers by combining hard and resonant soft X-ray reflectivity;Journal of Applied Physics;2016-06-28
5. Hard x-ray nanofocusing by multilayer Laue lenses;Journal of Physics D: Applied Physics;2014-06-05
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