Carrier mobility in the channel of AlGaN/(AlN)/GaN and InAlN/(AlN)/GaN heterostructures, limited by different scattering mechanisms: experiment and calculation

Abstract

Abstract Calculational analysis of different scattering mechanisms of two-dimensional electron gas in AlGaN/(AlN)/GaN and InAlN/(AlN)/GaN high-electron mobility transistors was carried out. It was found that the mobility of AlGaN-based structures at room temperature is mainly limited by inherent scattering mechanisms (namely, optical and acoustic phonon scattering), while the mobility in our InAlN-based structures is limited by the interface roughness scattering. The low-temperature mobility is found to be limited by the interface roughness scattering for both AlGaN- and InAlN-based structures.