Transport characteristics of N2(A3Σ+u), N(4S°), and N(2D°) in a remote nitrogen plasma source
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/441/i=1/a=012009/pdf
Reference20 articles.
1. Time-resolved LIF spectroscopy on N2(A) metastable in a He/N2 pulsed rf discharge
2. Quantitative and comparative characterizations of plasma process-induced damage in advanced metal-oxide-semiconductor devices
3. Quantum Chemical Investigation of Si Chemical Dry Etching by Flowing NF$_{3}$ into N$_{2}$ Downflow Plasma
4. Diode laser cavity-ringdown absorption spectroscopy for measuring N2(A3Σ+u) density in plasmas
5. Vacuum ultraviolet absorption spectroscopy for absolute density measurements of fluorine atoms in fluorocarbon plasmas
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3. Effect of discharge tube temperature on ${{\rm{N}}}_{2}({A}^{3}{{\rm{\Sigma }}}_{u}^{+})$ and ${\rm{N}}{(}^{4}{S}^{{\rm{o}}})$ densities in remote nitrogen plasma;Japanese Journal of Applied Physics;2020-08-25
4. Nitriding characteristics of 4H-SiC irradiated with remote nitrogen plasmas;Japanese Journal of Applied Physics;2016-02-16
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