Fabrication of Amorphous Silicon Carbide Films from Decomposition of Tetramethylsilane using ECR plasma of Ar
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/441/i=1/a=012039/pdf
Reference21 articles.
1. Handbook of SiC properties for fuel performance modeling
2. Deposition of SiC films by ion-enhanced plasma chemical vapor deposition using tetramethylsilane+H2
3. Selective effect of ion/surface interaction in low frequency PACVD of SiC:H films: Part A. Gas phase considerations
4. A study of microstructure and nanomechanical properties of silicon incorporated DLC films deposited on silicon substrates
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