Stress control of reactively sputtered thick NbN film on Si wafer changing the location of the substrate Si wafer against the Nb target on a magnetron cathode
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/871/i=1/a=012071/pdf
Reference17 articles.
1. Compact SMES with a superconducting film in a spiral groove on a Si wafer formed by MEMS technology with possible high-energy storage volume density comparable to that of rechargeable batteries
2. Anisotropic I–V characteristics of spontaneously emerged periodic stripes of superconducting NbN thin films on Si trench sidewall by RF magnetron sputtering
3. Argon Content of SiO2 Films Deposited by RF Sputtering in Argon
4. Argon entrapment in metal films by dc triode sputtering
5. Gas Incorporation into Sputtered Films
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Estimation of the Electricity Storage Volume Density of Compact SMESs of a New Concept Based on Si Microfabrication Technologies;Magnetochemistry;2021-03-23
2. Estimation of Electricity Storage Density of Compact SMESs Composed of Si-wafer Stacks Loaded with Superconducting Thin Film Coils in Spiral Trenches under the Constraints of the Critical Magnetic Flux Density;Journal of Physics: Conference Series;2020-07-01
3. Estimation of electricity storage capacity of compact SMESs composed of stacks of Si-wafers loaded with superconducting thin film coils in spiral trenches formed by MEMS process;Journal of Physics: Conference Series;2019-09-01
4. Replacement of NbN by YBa2Cu3O7-δ in superconducting thin film coil in a spiral trench on a Si-wafer for compact SMESs;Journal of Physics: Conference Series;2018-07
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