Current-pressure characteristics of dc magnetron discharge for high-rate sputtering
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/653/i=1/a=012127/pdf
Reference9 articles.
1. Current–pressure–voltage characteristics in a planar magnetron discharge
2. Current-pressure characteristics of planar magnetron discharges in rare gases
3. Charged particle fluxes from planar magnetron sputtering sources
4. On the carbon and tungsten sputtering rate in a magnetron discharge
5. 3D numerical simulation of gas heating effects in a magnetron sputter deposition system
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1. Surface temperature of a 2 in. Ti target during DC magnetron sputtering;Journal of Vacuum Science & Technology A;2024-03-22
2. Study of Plasma Parameters and Deposition Rate of Titanium Thin Film in a DC Magnetron Sputtering Method;Plasma Physics Reports;2022-05
3. Structure of DC magnetron sputtering discharge at various gas pressures: a two-dimensional particle-in-cell Monte Carlo collision study;Plasma Sources Science and Technology;2021-05-01
4. Correlation between plasma glow intensity distribution and sputtering profile in dc magnetron discharge;Journal of Physics: Conference Series;2019-01
5. Effect of interelectrode distance on dc magnetron current–pressure characteristics;Journal of Physics: Conference Series;2018-01
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