The dependence of the surface roughness of aluminum nitride films on the processing methods when magnetron sputtering is used

Abstract

Abstract The paper investigates the dependence of the surface roughness of aluminum nitride films on the modes of magnetron deposition. The paper shows the difference between the surfaces of polycrystalline aluminum nitride films on ceramized glass and silicon substrates grown under the same conditions. Atomic force microscopy was used to compare the surface roughness parameters of aluminum nitride obtained at different substrate temperatures and the power dissipation in the target. The optimal conditions for forming aluminum nitride films through magnetron sputtering have been determined.