Electron beam fabrication of masks in amorphous metalchalcogenide bilayers
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
http://stacks.iop.org/1742-6596/26/i=1/a=050/pdf
Reference3 articles.
1. Electron beam induced chemical modification of amorphous chalcogenide–metal bilayers and its application
2. The dissolution of metals in amorphous chalcogenides and the effects of electron and ultraviolet radiation
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1. Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-06-02
2. Effects of electron beam irradiation on a Ag/AsS2 bilayer using conductive atomic force microscopy;Thin Solid Films;2021-08
3. Growth of surface relief structures on Ag/AsS2 bilayer thin films by electron beam irradiation;Thin Solid Films;2017-08
4. The origin of electron beam patterning in silver/amorphous chalcogenide bilayers;Journal of Materials Science;2015-01-23
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