The study of the AlN/Si(111) epitaxial structures grown by PA MBE via coalescence overgrowth of AlN nanocolumns

Author:

Shubina K Yu,Mokhov D V,Berezovskaya T N,Nikitina E V,Mizerov A M,Bouravleuv A D

Abstract

Abstract The AlN/Si(111) epitaxial structures were synthesized by coalescence overgrowth of AlN nanocolumns using PA MBE technique. Such epitaxial structures can be used as a buffer layer for obtaining high quality AlN and GaN layers. Structural, electrical and chemical properties of these samples were studied. For the first time it was demonstrated that the etching of the obtained type of AlN/Si(111) structures in KOH can become a promising method for obtaining high quality free-standing AlN and GaN.

Publisher

IOP Publishing

Subject

General Physics and Astronomy

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Separation of AlN layers from silicon substrates by KOH etching;Journal of Physics: Conference Series;2021-12-01

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