Electrical contact resistance of tungsten coatings deposited on Cu and Al conductors

Abstract

Abstract In this work we study the effects of W coatings on the electrical contact resistance of Cu and Al conductors. The coatings were deposited by means of electron beam evaporation in a vacuum environment. The structure of the obtained samples was analysed using X-ray diffraction (XRD) and the surface roughness was studied by atomic force microscopy (AFM). The electrical contact resistance hysteresis of the W coatings and the base Al and Cu conductors is measured and analysed. The results obtained in this study are discussed concerning the possible applications of the coatings in the field of electrical engineering.