Simulation of deposition-topography granular distortion for TCAD-Reference-Cited by-同舟云学术

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Simulation of deposition-topography granular distortion for TCAD

Published:1998-05-01 Issue:3 Volume:6 Page:199-210
ISSN:0965-0393
Container-title:Modelling and Simulation in Materials Science and Engineering
language:
Short-container-title:Modelling Simul. Mater. Sci. Eng.

Author:

Karafyllidis I,Georgoulas N,Hagouel P I,Thanailakis A

Publisher

IOP Publishing

Subject

Computer Science Applications,Mechanics of Materials,Condensed Matter Physics,General Materials Science,Modelling and Simulation

Reference25 articles.

1. Total TCAD strategy for DFM in IC technology development

2. An industrial perspective of technology CAD for advanced CMOS technologies

3. Analysis of mixed-signal manufacturability with statistical technology CAD (TCAD)

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Cellular Automata Simulation Tool for Modelling and Automatic VLSI Implementation of the Oxidation Process in Integrated Circuit Fabrication;Lecture Notes in Computer Science;2006

2. A modified cellular automata algorithm for the simulation of boundary advancement in deposition topography simulation;Journal of Micromechanics and Microengineering;2005-11-29

3. A cellular automaton for the propagation of circular fronts and its applications;Engineering Applications of Artificial Intelligence;2005-09

4. A TCAD system for VLSI implementation of the CVD process using VHDL;Integration;2004-02

5. A cellular automaton methodology for the simulation of integrated circuit fabrication processes;Future Generation Computer Systems;2002-04

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