Measurement of the plasma and neutral gas flow velocities in a low-pressure hollow-cathode plasma jet sputtering system
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/0963-0252/22/i=1/a=015020/pdf
Reference19 articles.
1. Deposition of TiO2 on silicon by sputtering in hollow cathode
2. Effect of gas and cathode material on the r.f. hollow cathode reactive PVD
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5. Investigation of RF and DC plasma jet system during deposition of highly oriented ZnO thin films
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2. Optical emission spectroscopy study of plasma parameters in low-pressure hollow cathode plasma jet and planar magnetron powered by DC and pulsed DC supply;Vacuum;2022-11
3. Floating harmonic probe measurements in the low-temperature plasma jet deposition system;Journal of Physics D: Applied Physics;2017-12-19
4. The deposition of titanium dioxide nanoparticles by means of a hollow cathode plasma jet in dc regime;Plasma Sources Science and Technology;2015-06-08
5. Mode Transition and Related Discharge Phenomena of a Tube Plasma Source Operating in Low-Pressure Pure Nitrogen Atmosphere;IEEE Transactions on Plasma Science;2015-02
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