Study of a HPPMS discharge in Ar/O2mixture: II. Plasma optical emission and deposited RuOxfilm properties
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference43 articles.
1. Study of a HPPMS discharge in Ar/O2mixture: I. Discharge characteristics with Ru cathode
2. A novel pulsed magnetron sputter technique utilizing very high target power densities
3. Target material pathways model for high power pulsed magnetron sputtering
4. Pulsed dc Magnetron Discharges and their Utilization in Plasma Surface Engineering
Cited by 21 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. The semi-conductor of ZnO deposited in reactive HiPIMS;Applied Surface Science;2019-11
2. Observation of multiply charged states ions in a high-power pulsed reflex discharge;Plasma Sources Science and Technology;2019-10-17
3. High power impulse magnetron sputtering and its applications;Plasma Science and Technology;2018-04
4. First measurements of the temporal evolution of the plasma density in HiPIMS discharges using THz time domain spectroscopy;Plasma Sources Science and Technology;2018-03-14
5. Influences of target poisoning on the mechanical properties of TiCrBN thin films grown by a superimposed high power impulse and medium-frequency magnetron sputtering;Surface and Coatings Technology;2017-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3