Sheath expansion of two-dimensional grid electrodes subjected to short pulses of negative high-voltage-Reference-Cited by-同舟云学术

Sheath expansion of two-dimensional grid electrodes subjected to short pulses of negative high-voltage

Published:2015-01-13 Issue:1 Volume:24 Page:015032
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Yi Changho,Lee Huijea,Park Byungjae,Namkung Won,Cho Moohyun

Funder

National R&D Program through the National Research Foundation (NRF) of the Republic of Korea funded by the Ministry of Science, ICT & Future Planning (MSIP) (2009-0082506, NRF-2014M1A7A1A02029891)

BK21+ program of the division of advanced nuclear engineering, POSTECH through the NRF of the Republic of Korea funded by the Ministry of Education

MSIP of the Republic of Korea under the Korean ITER project

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Link

http://stacks.iop.org/0963-0252/24/i=1/a=015032/pdf

Reference31 articles.

1. Model of plasma immersion ion implantation

2. Model of plasma source ion implantation in planar, cylindrical, and spherical geometries

3. Plasma source ion‐implantation technique for surface modification of materials

4. Model of plasma immersion ion implantation for voltage pulses with finite rise and fall times

5. Sheath dynamics in plasma immersion ion implantation

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Analysis of grid electrode assisted plasma based ion implantation system and application to ion beam assisted deposition for insulator substrates;Thin Solid Films;2018-08

2. Normalized ion distribution function in expanding sheaths of 2D grid electrodes;Plasma Sources Science and Technology;2016-02-12