Dual-frequency capacitively coupled chlorine discharge
Author:
Funder
Icelandic Research Fund
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/0963-0252/24/i=1/a=015003/pdf
Reference56 articles.
1. Principles of Plasma Discharges and Materials Processing
2. Dual excitation reactive ion etcher for low energy plasma processing
3. Independent control of ion density and ion bombardment energy in a dual RF excitation plasma
4. Coupling effects of driving frequencies on the electron heating in electronegative capacitive dual-frequency plasmas
5. Space and phase resolved ion energy and angular distributions in single- and dual-frequency capacitively coupled plasmas
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