Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: excitation dynamics and ion flux asymmetry-Reference-Cited by-同舟云学术

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Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: excitation dynamics and ion flux asymmetry

Published:2016-07-08 Issue:4 Volume:25 Page:045019
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Bruneau B,Diomede P,Economou D J,Longo S,Gans T,O’Connell D,Greb A,Johnson E,Booth J-P

Funder

Department of Energy, Office of Fusion Energy Sciences

UK EPSRC

ANR

Doctoral School of Ecole Polytechnique

York-Paris Low Temperature Plasma Collaborative Research

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Link

http://stacks.iop.org/0963-0252/25/i=4/a=045019/pdf

Reference41 articles.

1. Optimization of the electrical asymmetry effect in dual-frequency capacitively coupled radio frequency discharges: Experiment, simulation, and model

2. PIC simulations of the separate control of ion flux and energy in CCRF discharges via the electrical asymmetry effect

3. The effect of the driving frequencies on the electrical asymmetry of dual-frequency capacitively coupled plasmas

4. Control of the ion flux and ion energy in CCP discharges using non-sinusoidal voltage waveforms

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1. Experimental investigation of an electronegative cylindrical capacitively coupled geometrically asymmetric plasma discharge with an axisymmetric magnetic field;Physics of Plasmas;2024-08-01

2. Fluid models calculation of Ar/CF₄ radiofrequency capacitively coupled plasmas;Physica Scripta;2024-07-15

3. Low-pressure inductively coupled plasmas in hydrogen: impact of gas heating on the spatial distribution of atomic hydrogen and vibrationally excited states;Plasma Sources Science and Technology;2024-02-01

4. Best impedance matching seeking of single-frequency capacitively coupled plasmas by numerical simulations;Journal of Applied Physics;2022-08-28

5. Electrical asymmetry effect in inhomogeneously magnetized capacitively coupled plasmas;Plasma Sources Science and Technology;2020-11-01

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