Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOxfilm growth
Author:
Funder
Austrian Science Fund
Lawrence Berkely National Laboratory
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/0963-0252/25/i=1/a=015022/pdf
Reference58 articles.
1. A novel pulsed magnetron sputter technique utilizing very high target power densities
2. Ionized physical vapor deposition (IPVD): A review of technology and applications
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5. Plasma diagnostics for understanding the plasma–surface interaction in HiPIMS discharges: a review
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