a-C:H/a-C:H(N) thin film deposition using 2.45 GHz expanding surface wave sustained plasmas
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference50 articles.
1. A new HF device for the production of long plasma columns at a high electron density
2. Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processing
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3. Growth and Microstructure of Nanoscale Amorphous Carbon Nitride Films Deposited by Electron Beam Irradiation of 1,2-Diaminopropane;The Journal of Physical Chemistry C;2009-06-15
4. On the Mechanism of Nitrogenated Carbon Film Deposition by PACVD in the Presence of Nitrogen. A Cryo-Trapping Assisted Mass Spectrometric Study;Chemical Vapor Deposition;2007-07
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