Observations of the long-term plasma evolution in a pulsed dc magnetron discharge
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference36 articles.
1. Pulsed magnetron sputter technology
2. Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering
3. Reactive pulsed magnetron sputtering process for alumina films
4. Ensuring long-term stability of process and film parameters during target lifetime in reactive magnetron sputtering
5. Using pulsed direct current power for reactive sputtering of Al2O3
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