Optical emission spectra of TEOS and HMDSO derived plasmas used for thin film deposition
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference27 articles.
1. Silicon oxide deposition from tetraethoxysilane in a radio frequency downstream reactor: Mechanisms and step coverage
2. Mass spectrometric study of tetraethoxysilane and tetraethoxysilane–oxygen plasmas in a diode type radio‐frequency reactor
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