Plasma characteristics of an Ar/CF4/N2discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model-Reference-Cited by-同舟云学术

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Plasma characteristics of an Ar/CF4/N2discharge in an asymmetric dual frequency reactor: numerical investigation by a PIC/MC model

Published:2006-04-27 Issue:3 Volume:15 Page:368-377
ISSN:0963-0252
Container-title:Plasma Sources Science and Technology
language:
Short-container-title:Plasma Sources Sci. Technol.

Author:

Georgieva V,Bogaerts A

Publisher

IOP Publishing

Subject

Condensed Matter Physics

Reference26 articles.

1. Dual excitation reactive ion etcher for low energy plasma processing

2. Independent control of ion density and ion bombardment energy in a dual RF excitation plasma

3. Prediction of Ion Energy and Angular Distributions in Single and Dual Frequency Plasmas

4. Dually driven radio frequency plasma simulation with a three moment model

5. Two-dimensional CT images of two-frequency capacitively coupled plasma

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