Structure of the velocity distribution of sheath-accelerated secondary electrons in an asymmetric RF-dc discharge
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/0963-0252/24/i=5/a=054003/pdf
Reference20 articles.
1. A Radio Frequency Driven DC Electron Beam Source
2. Reduction of microtrenching and island formation in oxide plasma etching by employing electron beam charge neutralization
3. Electron‐beam controlled radio frequency discharges for plasma processing
4. Study of temperature influence on electron beam induced deposition
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