Ray tracing calculations of ECR absorption in plasma etching and deposition devices
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference12 articles.
1. Resonant absorption of electromagnetic waves in a non-uniformly magnetized plasma
2. Two‐dimensional modeling of electron cyclotron resonance plasma production
3. Plasma uniformity and power deposition in electron cyclotron resonance etch tools
4. An eikonal expansion of the Vlasov–Maxwell equations valid near cyclotron resonance
5. Ray Tracing near the Electron Cyclotron Frequency with Application to EBT
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1. Ion extraction experiment for electron cyclotron resonance ion source with different magnetic topology;Acta Physica Sinica;2016
2. Plasma Characterization of a 10-cm Diameter Microwave Discharge Ion Thruster;Journal of Propulsion and Power;2004-07
3. Sheet-shaped plasma production using microwave-plasma interaction with ECR region;IEEE Transactions on Plasma Science;2003-02
4. Plasma Production Process in an ECR Ion Thruster;33rd Plasmadynamics and Lasers Conference;2002-05-20
5. Investigation of the electron energy distribution in an ECR discharge by means of Thomson scattering;Journal of Physics D: Applied Physics;2001-07-17
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