Two‐dimensional modeling of electron cyclotron resonance plasma production
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.351566
Reference6 articles.
1. Extremely high selective, highly anisotropic, and high rate electron cyclotron resonance plasma etching for n+ poly-Si at the electron cyclotron resonance position
2. Local Structure of ECR Process Plasma
3. Numerical model of rf glow discharges
4. A two‐dimensional model of dc glow discharges
5. Two-dimensional simulations of rf glow discharges inN2andSF6
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