Development of a new technique for high-energy secondary-electron measurements in plasma immersion ion implantation
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference11 articles.
1. Plasma source ion‐implantation technique for surface modification of materials
2. Repetitively pulsed metal ion beams for ion implantation
3. Plasma source ion implantation of oxygen and nitrogen in aluminum
4. Measurement of electron emission due to energetic ion bombardment in plasma source ion implantation
5. Development of a plasma immersion ion implanter for the surface treatment of metal components
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3. Observation of Optical Fluorescence of GaN Thin Films in an Inductively-Coupled Plasma Containing High Energy Electrons;Japanese Journal of Applied Physics;2011-01-01
4. Positive-plasma-bias method for plasma-based ion implantation and deposition;Surface and Coatings Technology;2010-06
5. Measurement of ion current distribution on a three-dimensional workpiece in the positive pulse bias PBII;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-01
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