Minimization of dry etch damage in III-V semiconductors

Author:

Rahman M,Deng L G,Berg J van den,Wilkinson C D W

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Plasma-induced quantum well intermixing for monolithic photonic integration;IEEE J SEL TOP QUANT;2005

2. Experimental and Theoretical Analysis of Argon Plasma-Enhanced Quantum-Well Intermixing;IEEE Journal of Quantum Electronics;2004-02

3. Detection of retinal signals using position sensitive microelectrode arrays;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2003-11

4. Electron cyclotron resonance plasma etching of GaSb in Cl[sub 2]/BCl[sub 3]/CH[sub 4]/Ar/H[sub 2] at room temperature;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2003

5. Large blueshift in InGaAs/InGaAsP laser structure using inductively coupled argon plasma-enhanced quantum well intermixing;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2003

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