Study of low energy {\rm Si}_5^- and Cs−implantation induced amorphization effects in Si(1 0 0)-Reference-Cited by-同舟云学术

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Study of low energy {\rm Si}_5^- and Cs−implantation induced amorphization effects in Si(1 0 0)

Published:2008-10-13 Issue:21 Volume:41 Page:215305
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Lenka H P,Joseph B,Kuiri P K,Sahu G,Mishra P,Ghose D,Mahapatra D P

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/41/i=21/a=215305/pdf

Reference45 articles.

1. Fabrication of Carbon Aerogels

2. Materials processing by gas cluster ion beams

3. Observation of Sputtered Si Surface Irradiated with Metal Cluster Complex Ions

4. Giant Metal Sputtering Yields Induced by 20–5000 keV/atom Gold Clusters

5. Sputtering of indium usingAumprojectiles: Transition from linear cascade to spike regime

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