Chromium silicide formation by argon irradiation of Cr/Si bilayers
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/41/i=3/a=035301/pdf
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1. Atomic mixing and interface reactions in Ta/Si bilayers during noble-gas ion irradiation
2. Ion-beam mixing in Fe/Si bilayers by singly and highly charged ions: evolution of phases, spike mechanism and possible effects of the ion-charge state
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4. Electronic structure of Cr silicides and Si-Cr interface reactions
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