A tin–gold alloy based EUV source for metrology applications-Reference-Cited by-同舟云学术

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A tin–gold alloy based EUV source for metrology applications

Published:2013-11-19 Issue:49 Volume:46 Page:495104
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Kambali Imam,Scally Enda,Dunne Padraig,O'Sullivan Gerry,Sheridan Paul,Sokell Emma,O'Reilly Fergal

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/46/i=49/a=495104/pdf

Reference30 articles.

1. Table-top reflectometer in the extreme ultraviolet for surface sensitive analysis

2. Optimizing 13.5nm laser-produced tin plasma emission as a function of laser wavelength

3. Plasma physics and radiation hydrodynamics in developing an extreme ultraviolet light source for lithography

4. Optimization of Extreme Ultraviolet Emission from Laser-Produced Tin Plasmas Based on Radiation Hydrodynamics Simulations

5. Variable composition laser-produced Sn plasmas—a study of their time-independent ion distributions

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Design of efficient broadband extreme ultraviolet multilayer mirrors using a two-parametric merit function;Optics Communications;2021-08

2. An Investigation of Laser Produced Lead-Tin Alloy Plasmas between 10 and 18 nm;Atoms;2020-10-20

3. A high-brightness accelerator-based EUV source for metrology applications;Photomask Technology 2018;2018-10-08

4. EUV spectral analysis of ns-laser produced bismuth plasmas at 8-17 nm;Optics Express;2017-04-21

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