Impacts of noble gas dilution on Si film structure prepared by atmospheric-pressure plasma enhanced chemical transport

Author:

Ohmi Hiromasa,Kishimoto Kazuya,Kakiuchi Hiroaki,Yasutake Kiyoshi

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Cited by 17 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. On-site SiH4 generator using hydrogen plasma generated in slit-type narrow gap;Journal of Physics D: Applied Physics;2018-05-24

2. The promotion of Argon and water molecule on direct synthesis of H2 O2 from H2 and O2;AIChE Journal;2017-10-23

3. Magnesium hydride film formation using subatmospheric pressure H2 plasma at low temperature;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-07

4. Selective deposition of a crystalline Si film by a chemical sputtering process in a high pressure hydrogen plasma;Journal of Applied Physics;2015-07-28

5. Atmospheric-pressure low-temperature plasma processes for thin film deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2014-05

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