Impacts of noble gas dilution on Si film structure prepared by atmospheric-pressure plasma enhanced chemical transport-Reference-Cited by-同舟云学术

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Impacts of noble gas dilution on Si film structure prepared by atmospheric-pressure plasma enhanced chemical transport

Published:2008-09-15 Issue:19 Volume:41 Page:195208
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Ohmi Hiromasa,Kishimoto Kazuya,Kakiuchi Hiroaki,Yasutake Kiyoshi

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/41/i=19/a=195208/pdf

Reference26 articles.

1. Low-temperature silicon homoepitaxy by hot-wire chemical vapor deposition with a Ta filament

2. Thin film micro- and polycrystalline silicon nip cells on stainless steel made by hot-wire chemical vapour deposition

3. Effect of substrate bias on high-rate synthesis of microcrystalline silicon films using a high-density microwave SiH4/H2plasma

4. Insights into the high-rate growth of highly crystallized silicon films from inductively coupled plasma of H2-diluted SiH4

5. Thin film Si solar cell fabricated at low temperature

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1. On-site SiH4 generator using hydrogen plasma generated in slit-type narrow gap;Journal of Physics D: Applied Physics;2018-05-24

2. The promotion of Argon and water molecule on direct synthesis of H2 O2 from H2 and O2;AIChE Journal;2017-10-23

3. Magnesium hydride film formation using subatmospheric pressure H2 plasma at low temperature;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-07

4. Selective deposition of a crystalline Si film by a chemical sputtering process in a high pressure hydrogen plasma;Journal of Applied Physics;2015-07-28

5. Atmospheric-pressure low-temperature plasma processes for thin film deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2014-05

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