The influence of rf power and oxygen flow rate during deposition on the optical transmittance of copper oxide thin films prepared by reactive magnetron sputtering-Reference-Cited by-同舟云学术

The influence of rf power and oxygen flow rate during deposition on the optical transmittance of copper oxide thin films prepared by reactive magnetron sputtering

Published:2005-01-07 Issue:2 Volume:38 Page:266-271
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Ogwu A A,Bouquerel E,Ademosu O,Moh S,Crossan E,Placido F

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/38/i=2/a=011/pdf

Reference22 articles.

1. Optical characterization of thin thermal oxide films on copper by ellipsometry

2. Deposition of copper oxide films by reactive laser ablation of copper formate in an r.f. oxygen plasma ambient

3. Photoelectrochemical properties of copper oxide thin films coated on an n-Si substrate

4. Copper oxide thin‐film growth using an oxygen plasma source

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