Elastically strain-sharing nanomembranes: flexible and transferable strained silicon and silicon–germanium alloys
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/40/i=4/a=R01/pdf
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1. Silicon Device Scaling to the Sub-10-nm Regime
2. High-mobility FET in strained silicon
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