A model for the halogen-based plasma etching of silicon
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/20/i=7/a=007/pdf
Reference52 articles.
1. Surface studies of and a mass balance model for Ar+ ion-assisted Cl2 etching of Si
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